Miin-Jang Chen

Atomic layer deposition (ALD) has emerged as a crucial technique to prepare nanoscale materials with mono-layer accuracy for a variety of applications. ALD provides a lot of benefits, such as accurate thickness and composition control, conformal step coverage, excellent uniformity, low defect density, good reproducibility, and low deposition temperatures. In our group, we focus on the physics and technologies of nanoelectronics, nanoplasmonics, and nanophotonics based on the ALD technology, including material growth, characterization, and device fabrication.

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