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建立於 2014-05-28, 週三 10:49
最近更新於 2014-05-28, 週三 11:01
發佈於：2014-05-28, 週三 10:49
點擊數：3152

Speaker: Dr. Thomas P. Moffat
Topic: Advances in Electrodeposition: From Superfilling to Atomic Layer Deposition

Speaker: Dr. Thomas Polk Moffat
Organization: Research Metallurgist, National Institute of Standards and Technology, USA
Topic: Advances in Electrodeposition: From Superfilling to Atomic Layer Deposition
Time: 10:30 AM ~ 12:10 PM, 2014.6.12
Location: Room 203, College of Engineering

附件:
Download this file (Dr. Moffat CV.doc)Dr. Moffat CV.doc156 kB