演講人:胡璧合 博士
服務單位:臺灣大學電機系
演講題目:Ferroelectric FET Non-volatile Memory
演講時間:109年11月30日(星期一)早上10點20分
演講地點:工綜館203國際演講廳
個人學歷:
國立交通大學/電子研究所/博士
國立交通大學/電子研究所/碩士
國立交通大學/材料科學與工程學系/學士
個人經歷:
國立台灣大學/電機工程學系/副教授 (現職)
國立中央大學/電機工程學系/副教授
國立中央大學/電機工程學系/助理教授
The Australian National University/Department of Electronic Materials Engineering/Visiting Scholar
University of California, Berkeley/Department of Electrical Engineering and Computer Sciences/Visiting Scholar
國立交通大學/智慧型記憶體及晶片系統實驗室/助理研究員
演講摘要:Artificial intelligence (AI) and Internet-of-Things (IoT) play a vital role in the future. For the von Neumann architecture, communication bottleneck between memory and processors becomes one of the most series problems due to low data throughput and high-power consumption. Non-volatile memory (NVM) based synapse and logic-in-memory circuit have been proposed to alleviate these problems. Ferroelectric Field-Effect-Transistor (FeFET) has been explored actively for emerging non-volatile memory and neuromorphic computing due to its high compatibility with CMOS platform. In this talk, I will introduce the operation principles and the challenges of FeFET memory. We have proposed a novel split-gate FeFET (SG-FeFET) for non-volatile memory and neuromorphic applications, which significantly improves the energy efficiency and reduces the power consumption. The reliability and endurance of SG-FeFET memory have also been improved owing to the lowered write voltage. SG-FeFET as a synaptic device has also been investigated including the non-linearity, asymmetry, and dynamic range of conductance updates.