5/11 Seminar Speech

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Parent Category: News

Category: Speeches

Created on Tuesday, 05 May 2020 09:37

Last Updated on Monday, 11 May 2020 13:20

Published on Tuesday, 05 May 2020 09:39

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Speaker: Doctor Jheng-Jhong Li

Topic: Applications and Challenges of Material Analysis Techniques in Semiconductor Industry

Speaker：Doctor Jheng-Jhong Li

Organization：Taiwan Semiconductor Manufacturing Company

Topic：Applications and Challenges of Material Analysis Techniques in Semiconductor Industry

Date：10:20 , 2020.5.11

Location：Room 203, College of Engineering

Education：

University of North Carolina at Chapel Hill (USA) / Chemistry / PhD

National Taiwan University / Chemistry / BS

Abstract：

State of the art semiconductor fabrication is driven by multitude of materials and processes advancements. In the past two decades, many novel material and process have been adopted, including SiGe stressor, high K / metal gate and finFET. While various material analysis techniques such as secondary ion mass spectrometry (SIMS), Xray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), or atomic force microscopy (AFM) have been useful to the development of new semiconductor fabrication, there are plenty of challenges in material characterization and metrology technology for faster cycle time, for complex 3D structure, and for comprehensive measurements of dimension, composition, dopant, strain, electrical and magnetic property. In this seminar, I will share some of my personal view and experience with semiconductor material analyses, and look forward to enriching feedback and discussion from the audience.