5/11(一)專題演講公告

演講人李正中   博士

服務單位台灣積體電路製造股份有限公司

演講題目Applications and Challenges of Material Analysis Techniques in Semiconductor Industry

演講時間109511(星期一)早上1020

演講地點工綜館203國際演講廳

個人學歷

美國北卡羅來納大學教堂山分校 / 化學系 / 博士

國立臺灣大學 / 化學系 / 學士

個人經歷

台灣積體電路製造股份有限公司 / 科技委員部 / 經理 

演講摘要

State of the art semiconductor fabrication is driven by multitude of materials and processes advancements. In the past two decades, many novel material and process have been adopted, including SiGe stressor, high K / metal gate and finFET. While various material analysis techniques such as secondary ion mass spectrometry (SIMS), Xray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), or atomic force microscopy (AFM) have been useful to the development of new semiconductor fabrication, there are plenty of challenges in material characterization and metrology technology for faster cycle time, for complex 3D structure, and for comprehensive measurements of dimension, composition, dopant, strain, electrical and magnetic property. In this seminar, I will share some of my personal view and experience with semiconductor material analyses, and look forward to enriching feedback and discussion from the audience.

出席學生

僅學號末一碼為偶數同學須出席(學號末一碼為奇數同學請至CEIBA及NTU COOL線上學習)

20200511-1