12/30 Seminar Speech

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上層分類：News

分類：Speeches

建立於 2019-12-24, 週二 10:25

最近更新於 2019-12-30, 週一 13:25

發佈於：2019-12-24, 週二 10:26

點擊數：4446

Speaker: Professor Jyh-Wei Lee

Topic: Recent Development of High Power Impulse Magnetron Sputtering (HiPIMS) Technique

Speaker：Professor Jyh-Wei Lee

Organization：Department of Materials Engineering, Ming Chi University of Technology

Topic：Recent Development of High Power Impulse Magnetron Sputtering (HiPIMS) Technique

Date：10:20 , 2019.12.30

Location：Room 203, College of Engineering

Education：

National Tsing Hua University / Department of Materials Science and Engineering / Ph.D.

Work Experience：

Ming Chi University of Technology / Department of Materials Engineering / Distinguished Professor

Tungnan University / College of Engineering / Dean

Tungnan University / Department of Mechanical Engineering / Professor

The Famcy Steel Corporation (U.S.A.) / Senior Engineer & Group Leader

Abstract：

Thin film technology is an enabling technology which can improve the physical, chemical, electrical and mechanical properties of materials in all kinds of industries in nowadays. Among several thin film deposition methods, the high-power impulse magnetron sputtering (HiPIMS), which was developed in 1999, can provide a rather high density plasma and high ion bombardment energy to induce a denser and finer film microstructure. The HiPIMS represents the state-of-the-art in the surface engineering and functional coating fabrication technology, which has been a great interest to the researchers and industries. In this talk, the basic principle and some important pros and cons of HiPIMS will be introduced. The concept and the applications of a newly developed superimposed HiPIMS technique for improving the lower deposition rate of HiPIMS will also be discussed in this talk.