12/30(一)專題演講公告

演講人李志偉   教授

服務單位明志科技大學材料工程系

演講題目Recent Development of High Power Impulse Magnetron Sputtering (HiPIMS) Technique

演講時間1081230(星期一)早上1020

演講地點工綜館203國際演講廳

個人學歷

國立清華大學 / 材料科學工程學系 / 博士

個人經歷

明志科技大學 / 材料工程系 / 特聘教授(現職)

明志科技大學 / 材料工程系 / 教授

東南科技大學 / 機械系 / 教授 & 工程學院院長

美國賓州匹茲堡 The Famcy Steel Corporation / Senior Engineer & Group Leader

演講摘要

Thin film technology is an enabling technology which can improve the physical, chemical, electrical and mechanical properties of materials in all kinds of industries in nowadays. Among several thin film deposition methods, the high-power impulse magnetron sputtering (HiPIMS), which was developed in 1999, can provide a rather high density plasma and high ion bombardment energy to induce a denser and finer film microstructure. The HiPIMS represents the state-of-the-art in the surface engineering and functional coating fabrication technology, which has been a great interest to the researchers and industries. In this talk, the basic principle and some important pros and cons of HiPIMS will be introduced. The concept and the applications of a newly developed superimposed HiPIMS technique for improving the lower deposition rate of HiPIMS will also be discussed in this talk.

20191230-1