Optoelectronic Thin-film Processing LAB


Feng-Yu Tsai 

(蔡豐羽 副教授)

PhD in Materials Science, University of Rochester


Research Summary
My research interests are in the properties and behaviors of materials used as functional thin films in organics-based or organics-related electronics. We use the technique of atomic layer deposition (ALD) as our main tool to fabricate thin films of a wide variety of materials for a wide variety of applications, which include organic light-emitting diodes (OLED), solar cells, thin-film transistors (TFT), supercapacitors, resistive-switching random access memories (RRAM). Our current research topics include nanolaminated films serving multiple functions—gas-permeation barriers, transparent conductors, passivating layers, charge-carrier-selecting/transporting layers, and dielectrics etc.—for flexible electroncis, nano-structure-based solid-state supercapacitors, and organic-inorganic nanolaminated super-lattice films.

Our Research

  • Atomic Layer Deposition (ALD)
  • Molecular Layer Deposition (MLD)
  • Thin-Film Transistors (TFTs)
  • Organic Thin-Film Transistors (OTFTs)
  • Resistive Switching Random Access Memories (RRAMs)
  • Organic Solar Cells (OSCs)
  • Silver Nanowires (Ag NWs)
  • Layer-by Layer Process 

Our Facilities

  • Atomic Layer Deposition equipment
  • Molecular Layer Deposition equipment
  • Glove Box
  • Thermal Evaporator


Our Pupblications

  • Atomic layer deposition technique and its applications
  • Organic Photoelectronics
  • Synthesis and applications of silver nanowire