NOEL

Nanoimprint & Nanofabrication


 

Laser Annealing

 

Nanopaticle Stacks


Intruded gold nanoclusters

(INC) method


Silicon Solar Cells &

Antireflection Coating

Nanoparticles

Nanoimprint &

Nanofabrication

Organic Solar Cells

Carbon Nanotube

 

Nano-imprinting in metal (NIM)

We describe a thermal embossing imprint method, which we name “nano-imprinting in metal” (NIM), for patterning metal films with a variety of profiles. Metal films exhibiting either perforated hole-arrays or corrugated structures with various surface morphologies can be fabricated rapidly. The SPR phenomenon allowed energy coupling to the other side of the textured metal film, causing a dramatic increase in the transmission. As a technique for readily controlling the working wavelength and transmittance, the NIM method has great potential for application in various optoelectronic devices.

 

Pic1
FDTD diagrams of a gold film
possessing
a continuous corrugated
structure having a period
of 400 nm with 90nm.


Pic2

Pic3
Schematic representations of the
NIM and double-imprinting processes

 
 
Copyright(c) 2008 Nano-optpelectronics Lab., Department of Material Science and Engineering, National Taiwan University
No. 1, Sec. 4, Roosevelt Road, Taipei, 10617 Taiwan(R.O.C)
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