國立臺灣大學 材料科學與工程學系暨研究所

C.H. Lin, H. L. Chen, F.H. Ko,” Influence of the mask magnification on imaging in hyper-NA lithography,” Journal of the Optical Society of America A-Optics Image Science and Vision, 24, 1633-1640 (2007)

H. L. Chen, K.T. Huang, C.H. Lin, W.Y. Wang, W. Fan,” Fabrication of sub-wavelength antireflective structures in solar cells by utilizing modified illumination and defocus techniques in optical lithography,” Microelectronic Engineering, 84, 750-754 (2007)

C.H. Lin, H. L. Chen, F.H. Ko,” Rigorous electromagnetic simulation of mask magnification effects on the diffracted light for EUV binary mask,” Microelectronic Engineering, 84, 711-715 (2007)

K. C. Hsieh, H. L. Chen, C. H. Lin, and C. Y. Lee, "Directly patterning ferroelectric films by nanoimprint lithography with low-temperature and low-pressure," J. Vac. Sci. Technol. B, 24 (6), 3234-3238 (2006).

H. L. Chen, Wonder Fan, C. C. Cheng, C. H. Lin, and K. T. Huang, "Fabrication of texturing antireflection structures in solar cells by using the defocusing exposure in optical lithography," Journal of The Electrochemical Society, 153 (9) G802-G806 (2006).

H. L. Chen, Y. H. Chu, C. I. Kuo, F. K. Liu, F. H. Ko, T. C. Chu, "Rapidly Selective Growth of Nanoparticles by Electron-Beam and Optical Lithographies with Chemically Amplified Resists," Electrochemical and Solid State Letter, 8 (2) 54-56 (2005).

H. L. Chen, C. Y. Li, C. C. Cheng, G. S. Lai, C. H. Lin, and C. Y. Lee, “Low-dielectric constant organosilicate glass incorporated with fluorine films as bottom antireflective coatings for sub-65 nm interconnection processes,” International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), PE.3 (2007).

C. H. Lin, H. L. Chen, and F. H. Ko, “Influence of 3D mask topographic profile in hyper NA lithography,” International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), PH.8 (2007).

H. L. Chen, S. S. Kuo, S. Y. Chuang, C. H. Lin, C. Y. Wang, “Directly patterning metal films by nanoimprint lithography for surface plasmonic device applications,” International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), 10B.5 (2007).

H. L. Chen, Y. H. Lin, S. Y. Chuang, D. H. Wan, and C. H. Lin, “Fabrication of gold-nanoparticle-infiltrated inverse opal structures with both photonic bandgap and surface plasmon resonance characteristics,” International Microprocesses and Nanotechnology Conference (MNC), (2007).

H. L. Chen, Wonder Fan, C. H. Lin, S. Y. Chuang, “Reduction of Polarization and Swing Effects in High Numerical Aperture Exposure Systems by utilizing Resist Antireflective Coatings,” Micro-and-Nano-Engineering (MNE), PRES-15 (2007).

K. C. Hsieh, H. L. Chen, and D. H. Wan, “Tunable surface plasmon resonance wavelength of gold nanoparticles embedded in lead zirconate titanate (PZT) films with an applying external electric field,” Micro-and-Nano-Engineering (MNE), 1A-2 (2007)

S. Y. Chuang, H. L. Chen, C. H. Lin, Y. H. Lin, S. S. Kuo, T. C. Cheng, "Fabrication of Sub-Wavelength Pyramidal Antireflection Structures in Solar Cells by Using Colloidal Lithography," International Conference on Nanoscience and Technology, Nanostructuring Scetion (2006)

K. C. Hsieh, H. L. Chen, C. H. Lin, and T. H. Hsu, "Fabrication of three-dimensional inverse-opal structures with tunable photonic bandgaps by utilizing polymer and silica hybrid colloids," Micro-and-Nano-Engineering (MNE), P-NSC15 (2006)

H. L. Chen, K. T. Huang, C. H. Lin, and Wonder Fan, "Fabrication of sub-wavelength antireflective structures in solar cells by utilizing modified illumination and defocus techniques in optical lithography," Micro-and-Nano-Engineering (MNE), P-PHO12 (2006)